发明名称 |
MASK MANUFACTURING EQUIPMENT AND MASK MAUFACTURING METHOD |
摘要 |
According to an embodiment, mask manufacturing equipment includes a detector, an irradiator, a calculator, and a controller. The detector detects positional deviation of a pattern formed on a mask substrate. The irradiator irradiates the mask substrate with laser light to form a heterogeneous layer that is expanded in volume in the mask substrate. The calculator calculates an area periphery irradiation condition under which the irradiator is caused to emit laser light to a peripheral area of the pattern on the basis of the positional deviation detected by the detector so that the pattern area is reduced by forming the heterogeneous layer in the peripheral area of the pattern. The controller controls the irradiator to form the heterogeneous layer in the peripheral area of the pattern according to the area periphery irradiation condition. |
申请公布号 |
EP2921907(A3) |
申请公布日期 |
2015.12.09 |
申请号 |
EP20150158388 |
申请日期 |
2015.03.10 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
KUGIMIYA, TETSUYA;FUKUHARA, KAZUYA;SATO, HIDENORI |
分类号 |
G03F1/00;G03F1/72;G03F1/82;G03F1/84;G03F7/20 |
主分类号 |
G03F1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|