| 摘要 |
A faceplate for a gas distribution system of a plasma processing chamber includes a faceplate body having a first surface, a second surface opposite to the first surface, and a side surface. A first plurality of holes in the faceplate body are extended from the first surface to the second surface. At least some of the first holes have a first size dimension and a second size dimension on a plane parallel to the first surface. The first size dimension is transverse to the second size dimension. The first size dimension is less than three plasma sheath thicknesses of plasma generated by the plasma processing chamber. The second size dimension is greater than two times the first size dimension. |
