| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an alignment mark which is provided to a template for imprint and has superior resistance to cleaning, and a template with the mark and a method of manufacturing the same. <P>SOLUTION: There is provided an alignment mark 13 for template used for an imprint method of pressing a template 10 having an unevenness pattern formed on one main surface of a light-transmissive base material against a photocuring material on a substrate to be processed, and optically curing the photocuring material by irradiating the photocuring material with light for exposing the photocuring material through the template 10 so as to transfer the unevenness pattern. The alignment mark 13 comprises an unevenness pattern part formed by digging the light-transmissive base material, and a light shield film pattern part 16 formed on the light-transmissive base material at the unevenness pattern part, and the light shield pattern part 16 is composed of a two-layer film of a light shield film 14 and a cleaning-resistive protection film 15 provided on the light shield film. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
