发明名称 ソフトリソグラフィ装置および方法
摘要 <p>The device has a flexible stamp or macro-stamp (10) comprising an elastomer layer with a face having a structured surface to form a transfer deposit. Another elastomer layer of the stamp or macro-stamp is in close connection with another face opposite the structured surface of the former elastomer layer. Soft ferromagnetic particles are dispersed in the latter elastomer layer, where dimension of the particles ranges from 10 micrometer to 200 micrometer. The elastomer layers are comprised of polydimethylsiloxane (PDMS). An independent claim is also included for a soft lithography method.</p>
申请公布号 JP5828664(B2) 申请公布日期 2015.12.09
申请号 JP20110096328 申请日期 2011.04.22
申请人 イノプシス 发明人 コー.ジャン‐クリストフ;ラフォルグ.リュドヴィーク
分类号 B29C59/02;H01L21/027 主分类号 B29C59/02
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