| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an electron beam drawing method and an electron beam drawing system which are capable of suppressing a variation in position irradiated with an electron beam due to its drift and capable of drawing a desired pattern. <P>SOLUTION: A positional displacement amount near the center of each main deflection region of a charged-particle beam is determined. Correction values are determined from a plurality of the positional displacement amounts. A position irradiated with the charged-particle beam is corrected from the correction values. The neighborhood of the center of the main deflection region can be a sub deflection region including the center of the main deflection region. In this case, the positional displacement amount can be one for one arbitrary point in the sub deflection region. Alternatively, the positional displacement amount can also be the average of positional displacement amounts at a plurality of arbitrary points in the sub deflection region. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
