发明名称 基板処理装置
摘要 <p>A substrate treating apparatus for immersing substrates in a treating liquid. An inner tank stores the treating liquid, an outer tank collects the treating liquid overflowing the inner tank, and a lifter moves the substrates between a standby position above the inner tank and a treating position inside the inner tank. Circulation piping connects the inner tank and the outer tank. The treating liquid overflows the inner tank into the outer tank in a treating state with the lifter and the substrates located in the treating position. The treating liquid remains in the inner tank without overflowing in a non-treating state with the lifter and the substrates located in the standby position. The treating liquid flows from the inner tank to the outer tank through the circulating piping in a non-treating circulation state before the lifter moves the substrates to the treating position.</p>
申请公布号 JP5829458(B2) 申请公布日期 2015.12.09
申请号 JP20110183696 申请日期 2011.08.25
申请人 株式会社SCREENホールディングス 发明人 前川 直嗣
分类号 H01L21/304;B65G49/02;H01L21/306 主分类号 H01L21/304
代理机构 代理人
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