SYSTEMS AND METHODS FOR SUB-APERTURE BASED ABERRATION MEASUREMENT AND CORRECTION IN INTERFEROMETRIC IMAGING

摘要

Systems and methods for sub-aperture correlation based wavefront measurement in a thick sample and correction as a post processing technique for interferometric imaging to achieve near diffraction limited resolution are described. Theory, simulation and experimental results are presented for the case of full field interference microscopy. The inventive technique can be applied to any coherent interferometric imaging technique and does not require knowledge of any system parameters. In one embodiment of the present invention, a fast and simple way to correct for defocus aberration is described. A variety of applications for the inventive method are presented.