| 发明名称 |
METHOD OF PRODUCING HARDMASK LAYER, METHOD OF PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE THEREOF |
| 摘要 |
According to an embodiment of the present invention, a method for forming a hardmask layer comprises the following steps: forming a material layer on a substrate; applying a hardmask composition on the material layer; and processing the hardmask composition with heat in multi-step. |
| 申请公布号 |
KR20150137425(A) |
申请公布日期 |
2015.12.09 |
| 申请号 |
KR20140065273 |
申请日期 |
2014.05.29 |
| 申请人 |
CHEIL INDUSTRIES INC. |
发明人 |
MOON, JOON YOUNG;LEE, CHUNG HEON;CHOI, YOO JEONG;KIM, YUN JUN;PARK, YOU JUNG;YOON, YONG WOON |
| 分类号 |
H01L21/027;G03F7/20;H01L21/324 |
主分类号 |
H01L21/027 |
| 代理机构 |
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