发明名称 |
Vertical topology light-emitting device |
摘要 |
A vertical topology light emitting device comprises a metal support structure; an adhesion structure on the metal support structure, wherein the adhesion structure comprises a first adhesion layer and a second adhesion layer on the first adhesion layer; a metal layer on the adhesion structure, wherein the adhesion structure is thicker than the metal layer; a GaN-based semiconductor structure on the metal layer, wherein the GaN-based semiconductor structure has a thickness less than 5 micrometers; a multi-layered electrode structure on the GaN-based semiconductor structure; and a protective layer on a side surface and a top surface of the GaN-based semiconductor structure, wherein the protective layer is further disposed on the multi-layered electrode structure. |
申请公布号 |
US9209360(B2) |
申请公布日期 |
2015.12.08 |
申请号 |
US201414586418 |
申请日期 |
2014.12.30 |
申请人 |
LG INNOTEK CO., LTD. |
发明人 |
Yoo Myung Cheol |
分类号 |
H01L33/00;H01L33/32;H01L33/40;H01L33/60;H01L33/04;H01L33/14;H01L33/38;H01L33/42;H01L33/62;H01L33/46;H01L33/64 |
主分类号 |
H01L33/00 |
代理机构 |
Dentons US LLP |
代理人 |
Dentons US LLP |
主权项 |
1. A light emitting device, comprising:
a metal support structure comprising Cu; an adhesion structure on the metal support structure; a first metal layer on the adhesion structure; a second metal layer comprising Ti on the first metal layer; a GaN-based semiconductor structure on the second metal layer, wherein the GaN-based semiconductor structure has a thickness less than 5 micrometers; an interface layer on the GaN-based semiconductor structure; and a contact pad on the interface layer, wherein the second metal layer comprises a portion that directly contacts the GaN-based semiconductor structure, and wherein a thickness of the metal support structure is 0.5 times or less than that of a side width of the GaN-based semiconductor structure. |
地址 |
Seoul KR |