发明名称 Vertical topology light-emitting device
摘要 A vertical topology light emitting device comprises a metal support structure; an adhesion structure on the metal support structure, wherein the adhesion structure comprises a first adhesion layer and a second adhesion layer on the first adhesion layer; a metal layer on the adhesion structure, wherein the adhesion structure is thicker than the metal layer; a GaN-based semiconductor structure on the metal layer, wherein the GaN-based semiconductor structure has a thickness less than 5 micrometers; a multi-layered electrode structure on the GaN-based semiconductor structure; and a protective layer on a side surface and a top surface of the GaN-based semiconductor structure, wherein the protective layer is further disposed on the multi-layered electrode structure.
申请公布号 US9209360(B2) 申请公布日期 2015.12.08
申请号 US201414586418 申请日期 2014.12.30
申请人 LG INNOTEK CO., LTD. 发明人 Yoo Myung Cheol
分类号 H01L33/00;H01L33/32;H01L33/40;H01L33/60;H01L33/04;H01L33/14;H01L33/38;H01L33/42;H01L33/62;H01L33/46;H01L33/64 主分类号 H01L33/00
代理机构 Dentons US LLP 代理人 Dentons US LLP
主权项 1. A light emitting device, comprising: a metal support structure comprising Cu; an adhesion structure on the metal support structure; a first metal layer on the adhesion structure; a second metal layer comprising Ti on the first metal layer; a GaN-based semiconductor structure on the second metal layer, wherein the GaN-based semiconductor structure has a thickness less than 5 micrometers; an interface layer on the GaN-based semiconductor structure; and a contact pad on the interface layer, wherein the second metal layer comprises a portion that directly contacts the GaN-based semiconductor structure, and wherein a thickness of the metal support structure is 0.5 times or less than that of a side width of the GaN-based semiconductor structure.
地址 Seoul KR