发明名称 SRAM well-tie with an uninterrupted grated first poly and first contact patterns in a bit cell array
摘要 An integrated circuit containing an SRAM may be formed using one or more periodic photolithographic patterns for elements of the integrated circuit such as gates and contacts, which have alternating line and space configurations in SRAM cells. Strap rows of the SRAM containing well ties and/or substrate taps which have SRAM cells on two opposite sides are configured so that the alternating line and space configurations are continuous across the regions containing the well ties and substrate taps.
申请公布号 US9209195(B2) 申请公布日期 2015.12.08
申请号 US201313874806 申请日期 2013.05.01
申请人 TEXAS INSTRUMENTS INCORPORATED 发明人 Seshadri Anand;Prins Steve;McMullan Russell
分类号 H01L21/70;H01L27/11;H01L27/02 主分类号 H01L21/70
代理机构 代理人 Garner Jacqueline J.;Cimino Frank D.
主权项 1. An integrated circuit, comprising: a static random access memory (SRAM), comprising: a strap row containing at least one of a well tie and a substrate tap;a first SRAM cell region adjacent to said strap row;a second SRAM cell region adjacent to said strap row opposite from said first SRAM cell region;a plurality of circuit elements disposed in said strap row, in said first SRAM cell region and in said second SRAM cell region, said circuit elements being configured in a periodic pattern of alternating lines and spaces, such that a difference between a pitch length of said circuit elements in said strap row and a pitch length of said circuit elements in said first SRAM cell region and in said second SRAM cell region is within 10 percent;a first half-cell row located between said strap row and said first SRAM cell region; anda second half-cell row located between said strap row and said second SRAM cell region.
地址 Dallas TX US