Radiation source with a debris mitigation system, lithographic apparatus with a debris mitigation system, method for preventing debris from depositing on collector mirror, and device manufacturing method

摘要

A lithographic apparatus includes a radiation source configured to produce extreme ultraviolet radiation, the radiation source including a chamber in which a plasma is generated; a collector mirror configured to reflect radiation emitted by the plasma; and a debris mitigation system including a gas supply system configured to supply a first gas flow toward the plasma, the first gas flow being selected to thermalize debris generated by the plasma, and a plurality of gas manifolds arranged at a location proximate the collector mirror, the gas manifolds configured to supply a second gas flow in the chamber, the second gas flow being directed toward the plasma to prevent thermalized debris from depositing on the collector mirror.

主权项

1. A lithographic apparatus comprising:
a radiation source configured to produce extreme ultraviolet radiation, the radiation source including
a chamber in which a plasma is generated;a collector mirror having a surface configured to reflect radiation emitted by the plasma towards a focal point; anda debris mitigation system including
a gas supply system configured to supply a first gas flow toward the plasma in a direction substantially perpendicular to a direction of propagation of the radiation reflected by the collector mirror towards the focal point to form a gas curtain around the plasma, the first gas flow being selected to thermalize debris generated by the plasma, anda plurality of gas manifolds arranged at a location between the plasma and the surface of the collector mirror and proximate the surface of the collector mirror and extending substantially along a length of the collector mirror, each gas manifold having a diameter and a plurality of gas outlets configured to supply a second gas flow in the chamber, the second gas flow being directed toward the plasma to prevent thermalized debris from depositing on the collector mirror.