发明名称 |
Semiconductor device having stacked substrates with protruding and recessed electrode connection |
摘要 |
A first substrate with a penetration electrode formed thereon is stacked on a second substrate with a protruding electrode formed thereon. The penetration electrode has a recessed portion. The substrates are stacked with the protruding electrode entered in the recessed portion. A distal width of the protruding electrode is smaller than an opening width of the recessed portion. |
申请公布号 |
US9209112(B2) |
申请公布日期 |
2015.12.08 |
申请号 |
US201414504957 |
申请日期 |
2014.10.02 |
申请人 |
Seiko Epson Corporation |
发明人 |
Imai Hideo |
分类号 |
H01L23/48;H01L23/00;H01L25/07;H01L21/768;H01L25/065 |
主分类号 |
H01L23/48 |
代理机构 |
Harness, Dickey & Pierce, P.L.C. |
代理人 |
Harness, Dickey & Pierce, P.L.C. |
主权项 |
1. A semiconductor device comprising:
a first substrate having a first face and a second face; a penetration electrode that is disposed so as to penetrate the first substrate; a second substrate; and a protruding electrode that protrudes from the second substrate, the penetration electrode having a recess at a first face side, and the protruding electrode entering into the recess, a thickness of the penetration electrode in a direction crossing a direction from the first face to the second face being thicker toward a bottom of the recess from the first face side. |
地址 |
JP |