| 发明名称 | Method for the treatment and direct bonding of a material layer | ||
| 摘要 | A method for treating at least one first material layer including siloxane bonds, wherein at least one surface can be interlocked with a surface of a second material layer by direct bonding, the method including: at least one forced diffusion at a temperature greater than or equal to 30° C., at least in the first material layer, of chemical species including at least one pair of free electrons and at least one labile proton; and converting at least one portion of the siloxane bonds into silanol bonds in at least one portion of the first material layer extending from the surface to a depth greater than or equal to approximately 10 nm. | ||
| 申请公布号 | US9209068(B2) | 申请公布日期 | 2015.12.08 |
| 申请号 | US201214353883 | 申请日期 | 2012.10.24 |
| 申请人 | Commissariat a l'energie atomique et aux energies alternatives | 发明人 | Moriceau Hubert;Fournel Franck;Morales Christophe;Rauer Caroline |
| 分类号 | H01L21/30;H01L21/46;H01L21/762;H01L21/20;H01L21/3105;H01L21/02;H01L21/223;H01L21/228;H01L21/306 | 主分类号 | H01L21/30 |
| 代理机构 | Oblon, McClelland, Maier & Neustadt, L.L.P. | 代理人 | Oblon, McClelland, Maier & Neustadt, L.L.P. |
| 主权项 | 1. A method for treating at least one first material layer including siloxane bonds, wherein at least one surface of the first material layer is configured to be interlocked with a surface of a second material layer by direct bonding, the method comprising: at least one forced diffusion at a temperature greater than or equal to 30° C., at least in the first material layer, of chemical species comprising at least one pair of free electrons and at least one labile proton; and converting at least one portion of the siloxane bonds into silanol bonds in at least one portion of the first material layer extending from the surface to a depth greater than or equal to approximately 10 nm. | ||
| 地址 | Paris FR | ||