Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus

摘要

The disclosure concerns an arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus. The mirror has an optical effective surface and at least one access passage extending from a surface of the mirror, that does not correspond to the optical effective surface, in the direction of the effective surface. The arrangement is designed for mirror temperature measurement and/or thermal actuation of the mirror via electromagnetic radiation which is propagated along the access passage. The electromagnetic radiation is reflected a plurality of times within the access passage.

主权项

1. An arrangement, comprising:
a mirror having an optical effective surface, a second surface different from the optical effective surface, and an access passage extending from the second surface in a direction of the optical effective surface, the access passage having sidewalls; wherein the arrangement is configured so that:
a measurement of a temperature of the mirror and/or a thermal actuation of the mirror is achievable based on electromagnetic radiation which has undergone multiple reflections with the sidewalls of the access passage;all the electromagnetic radiation that contributes to the mirror temperature measurement and/or the thermal actuation of the mirror has a reflection angle with the sidewalls of the access passage that is not greater than 20°; andthe electromagnetic radiation is coupleable via the access passage into a region in immediate proximity of the optical effective surface.