发明名称 Nitrogen-containing monomer, polymer, resist composition, and patterning process
摘要 A chemically amplified positive resist composition of better performance can be formulated using a polymer having a quencher incorporated therein, specifically a polymer comprising recurring units having a carbamate structure which is decomposed with an acid to generate an amino group and optionally recurring units having an acid labile group capable of generating a carboxyl and/or hydroxyl group under the action of an acid. The polymer is highly effective for suppressing diffusion of acid and diffuses little itself, and the composition forms a pattern of rectangular profile at a high resolution.
申请公布号 US9207534(B2) 申请公布日期 2015.12.08
申请号 US201213349754 申请日期 2012.01.13
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 Sagehashi Masayoshi;Hatakeyama Jun;Watanabe Takeru;Kobayashi Tomohiro
分类号 G03F7/039;G03F7/004;G03F7/30;G03F7/20;C07D211/44 主分类号 G03F7/039
代理机构 Westerman, Hattori, Daniels & Adrian, LLP 代理人 Westerman, Hattori, Daniels & Adrian, LLP
主权项 1. A chemically amplified positive resist composition comprising 100 parts by weight of a polymer comprising recurring units (a) having the formula (2), at least one of recurring units (b) and (c) represented by the general formula (3) and having an acid labile group-substituted carboxyl and/or hydroxyl group, and recurring units (d) having an adhesive group selected from among hydroxyl, carboxyl, lactone ring, carbonate, thiocarbonate, carbonyl, cyclic acetal, ether, ester, sulfonic acid ester, cyano, amide, and —O—C(═O)-G- wherein G is sulfur or NH, 50 to 10,000 parts by weight of an organic solvent, 0.01 to 100 parts by weight of an acid generator in the form of a sulfonium salt having the general formula (15), 0 to 100 parts by weight of a basic compound, and 0 to 10 parts by weight of a surfactant,wherein R1 is hydrogen, fluorine, methyl or trifluoromethyl, R2 is hydrogen or a straight, branched or cyclic, mono or divalent hydrocarbon group of 1 to 10 carbon atoms, R3 is an acid labile group of 1 to 15 carbon atoms, A1 is a straight, branched or cyclic, divalent hydrocarbon group of 1 to 10 carbon atoms, A2 is a straight, branched or cyclic, di or trivalent hydrocarbon group of 1 to 10 carbon atoms, A2 and R2 may bond together to form a ring with the adjacent nitrogen atom, k1 is 0, R3 is an acid labile group selected from the following:wherein the broken line denotes a valence bond, and “a” is a number in the range: 0<a<1.0,wherein R4 and R6 each are hydrogen or methyl; R5 and R8 each are an acid labile group; R7 is a straight, branched or cyclic C1-C10 alkylene group or a trivalent form of the alkylene group with one hydrogen eliminated, which may contain an ether or ester moiety, or a phenylene or naphthylene group; Y is a single bond or —C(═O)—O—R9—; R9 is a straight, branched or cyclic C1-C10 alkylene group which may contain an ether or ester moiety, or a phenylene or naphthylene group; Z is a single bond or —C(═O)—O—R10—; R10 is a straight, branched or cyclic C1-C10 alkylene group which may contain an ether or ester moiety, or a phenylene or naphthylene group; the phenylene and naphthylene groups may be substituted with fluorine, trifluoromethyl, cyano, amide or C1-C6 alkyl or alkoxy radical; n is 1 or 2, b and c are numbers in the range: 0≦b<1.0, 0≦c<1.0, and 0<b+c<1,wherein Rp5, Rp6, and Rp7 are each independently a straight, or branched C1-C10 alkyl, alkenyl or oxoalkenyl group which may contain fluorine, hydroxyl or ether bond, or a substituted or unsubstituted C6-C18 aryl, aralkyl or aryloxoalkyl group, alternatively, any two or more of Rp5, Rp6, and Rp7 may bond together to form a ring with the sulfur atom, Rp8 is hydrogen or trifluoromethyl, Rp9 is a straight, branched or cyclic C6-C30 monovalent hydrocarbon group which may contain a heteroatom.
地址 Tokyo JP