发明名称 TRANSISTOR USING NITRIDE SEMICONDUCTOR AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a transistor having a nitride semiconductor and a manufacturing method of the same, which can inhibit an increase in inter-electrode capacitance including drain-source capacitance Cds.SOLUTION: A transistor comprises L-shaped metals 10 which are formed on both lateral faces of a gate electrode 8 on the source electrode 6 side and the drain electrode 7 side via an insulation film layer 9, and which are in a floating state.
申请公布号 JP2015220319(A) 申请公布日期 2015.12.07
申请号 JP20140102563 申请日期 2014.05.16
申请人 MITSUBISHI ELECTRIC CORP 发明人 YAMAGUCHI YUTARO;OISHI TOSHIYUKI;OTSUKA HIROSHI;YAMANAKA KOJI
分类号 H01L21/338;H01L29/06;H01L29/778;H01L29/812 主分类号 H01L21/338
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