发明名称 |
TRANSISTOR USING NITRIDE SEMICONDUCTOR AND MANUFACTURING METHOD OF THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a transistor having a nitride semiconductor and a manufacturing method of the same, which can inhibit an increase in inter-electrode capacitance including drain-source capacitance Cds.SOLUTION: A transistor comprises L-shaped metals 10 which are formed on both lateral faces of a gate electrode 8 on the source electrode 6 side and the drain electrode 7 side via an insulation film layer 9, and which are in a floating state. |
申请公布号 |
JP2015220319(A) |
申请公布日期 |
2015.12.07 |
申请号 |
JP20140102563 |
申请日期 |
2014.05.16 |
申请人 |
MITSUBISHI ELECTRIC CORP |
发明人 |
YAMAGUCHI YUTARO;OISHI TOSHIYUKI;OTSUKA HIROSHI;YAMANAKA KOJI |
分类号 |
H01L21/338;H01L29/06;H01L29/778;H01L29/812 |
主分类号 |
H01L21/338 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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