发明名称 MOLD FOR NANOIMPRINT
摘要 PROBLEM TO BE SOLVED: To transfer a fine pattern inexpensively in excellent throughput.SOLUTION: A hollow tunnel passing the mold outside is connected to a fine pattern of a conventional mold for nanoimprint, and gas or a mold release agent is sent directly to the fine pattern engraved on the mold, and pressure or temperature control to a resin in the fine pattern engraved on the mold is performed, and further the mold release agent is applied into the fine pattern of the mold in each release of the resin.
申请公布号 JP2015217676(A) 申请公布日期 2015.12.07
申请号 JP20140130768 申请日期 2014.05.19
申请人 SHINOHARA YASUKO 发明人 SHINOHARA KATSUHIKO
分类号 B29C59/02;B29C33/38;H01L21/027 主分类号 B29C59/02
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