IMPROVED GAS INTAKE AND EXHAUST DEVICE FOR HEAT TREATMENT OF SUBSTRATE AND HEAT TREATMENT APPARATUS OF SUBSTRATE HAVING THE SAME

摘要

Disclosed are an improved gas supply and exhaust device for heat treatment of a substrate, and a substrate heat treatment device having the same. The gas supply and exhaust device for heat treatment of a substrate comprises: upper and lower support cross bars constituting a frame of a boat which loads and supports upper and lower substrates in a substrate heat treatment chamber; an upper cross bar provided in a direction parallel to the upper support cross bar on an upper portion of the upper substrate; a gas supply device connected to the upper cross bar and one side end portion of the upper support cross bar from a side surface of the outside of the chamber through a supply line; and a gas exhaust device provided on both side surfaces of the chamber in a direction parallel to the longitudinal direction of the upper support cross bar. The upper cross bar and the upper support cross bar have a plurality of lower supply holes, individually.