| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem that a resistance of a wiring of a detection electrode comprising an ITO film is high, and detection capability degrades as size is increased and preciseness is raised.SOLUTION: A method of manufacturing a display device includes a step (a) in which a metal film is formed on a substrate, a step (b) in which the metal film is patterned to form a metal layer, and a step (c) in which, after the (b) step, a low reflection layer made from resin is formed on the metal layer. The (b) step includes a step (b1) in which an etching protection film is formed, a step (b2) in which the etching protection film is patterned, and a step (b3), after the (b2) step, the metal film is etched. |
