发明名称 METHOD OF PRODUCING GALLIUM NITRIDE
摘要 PROBLEM TO BE SOLVED: To provide a method of producing gallium nitride which allows for production of gallium nitride at low temperature, without using a hard-to-handle material.SOLUTION: Gallium nitride is produced by irradiating a gallium trihalide held on a substrate with a nitrogen neutral particle beam. Preferably, irradiation of a nitrogen neutral particle beam is performed for a thin film of a gallium trihalide formed on the substrate. Preferably, the thin film of a gallium trihalide is formed by applying a coating liquid, containing a gallium trihalide, onto the substrate.
申请公布号 JP2015220443(A) 申请公布日期 2015.12.07
申请号 JP20140105585 申请日期 2014.05.21
申请人 TOKYO OHKA KOGYO CO LTD;TOKYO INSTITUTE OF TECHNOLOGY;TOHOKU UNIV 发明人 SAGAWA SEIJI;OKADA KEN;YAMAMOTO KIMIHISA;IMAOKA YUKITOSHI
分类号 H01L21/205 主分类号 H01L21/205
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