MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD

摘要

A measuring apparatus includes: an imaging unit disposed on and fixed at the first member; a first detector comprised to detect a location of a stage with respect to the second member; a second detector comprised to detect a change in a location of the first member with respect to the second member; and a control unit comprised to obtain a location of a mark from an image of the mark imaged by the imaging unit while controlling a relative location of the stage for a second member, to reduce a change in a relative location of the mark of the imaging unit by the change in the location of the first member based on the detection results of the first and second detectors.