| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate liquid treatment device which can form a puddle of liquid on a substrate surface with minimum consumed amount of a treatment liquid and form a flow of the treatment liquid on the substrate surface.SOLUTION: A substrate liquid treatment device has an enclosure member (60) which forms an accumulation part for accumulating a treatment liquid supplied to a substrate (W) held by a substrate holding part (31). The enclosure member has a ring-shaped bottom wall (61) opposed to a peripheral region of an undersurface of the substrate (W) across a gap (G) and a ring-shaped side wall (62) which enclose a peripheral border of the substrate from the outside in a radial direction across a gap and extends to a position higher than a top face of the substrate. When the treatment liquid is supplied to the top face of the substrate along with rotation of the substrate, the treatment liquid entered a gap (G) between the bottom wall of the enclosure member and the undersurface of the substrate which faces the bottom wall is prevented from flowing from the gap to the inside in the radial direction. This makes it possible to perform treatment by formation of a puddle of liquid along with rotation of the substrate. |
