| 摘要 |
A photosensitive resin having three functional groups enabling easy formation of a pattern comprises a repeated unit represented by chemical formula 1. In chemical formula 1, R is a hexavalent group connected to three functional groups (group Y) or a tetravalent group connected to two functional groups (group Y), and is an organic group including or not including an aromatic ring compound or an inorganic group not including an aromatic ring compound; X is a hexavalent group connected to three functional groups (chemical formula 2) or a tetravalent connected to two functional groups (chemical formula 2), and is a linear, branched, and/or cyclic hydrocarbon group having 3 to 20 oxygen atoms and 3 to 60 carbon atoms; Y is a leaving group separated by an acid by being bonded to an oxygen atom (O) of a hydroxyl group (-OH) included in R, and is a hydrocarbon group having 1 to 10 oxygen atoms, and 1 to 20 carbon atoms; a, b, and c are the numbers of Y, and are independently an integer number of zero to four; m, n, p, and q are independently an integer number of zero or one, and the sum of m, n, p, and q is two to four; and the sum of p and q is one or two. |
