FUNCTIONAL DEVICE, AND METHOD FOR MANUFACTURING VANADIUM DIOXIDE THIN FILM

摘要

PROBLEM TO BE SOLVED: To provide an apparatus for forming a thin film at low cost with high mass productivity.SOLUTION: A functional device 27 comprises: a device substrate 20; a buffer thin film 13 composed of a titanium dioxide thin film formed on the device substrate; and a functional thin film 16 formed on a surface of the buffer thin film and made of vanadium dioxide. The functional thin film 16 has high crystallinity, which causes its resistance value to largely change before and that after phase transition. Therefore, the functional device 27 of the present invention, such as a storage device or a thermistor, is superior in electric property.