Top Dielectric Quartz Plate and Slot Antenna Concept

摘要

Techniques disclosed herein include an apparatus for treating substrates with plasma generated within a plasma processing chamber. In one embodiment, dielectric plates, of a plasma system can include structural features configured to assist in generating a uniform plasma. Such structural features define a surface shape, on a surface that faces the plasma. Such structural features can include a set of concentric rings having an approximately non-linear cross section, and protrude into the surface of the dielectric plate. Such structural features may include feature depth, width, and periodic patterns that may vary depth and width along the concentric rings.

主权项

1. A plasma processing apparatus for a microelectronic substrate, comprising:
a substrate holder that can receive the microelectronic substrate; an antenna disposed opposite of the substrate holder; and a dielectric component disposed between the substrate holder and the antenna, the dielectric component comprising:
a first surface;a second surface that is opposite the first surface and is further from the antenna than the first surface;a thickness of less than 30 mm;two or more concentric grooves disposed around a center point of the dielectric element;wherein the grooves comprise:
a non-linear cross section;a width between 10 mm and 60 mm at the second surface of the dielectric element; anda depth between 5 mm and 25 mm from the second surface.