发明名称 PHYSICAL UNCLONABLE INTERCONNECT FUNCTION ARRAY
摘要 A method for fabricating an interconnect function array includes forming a first plurality of conductive lines on a substrate, forming an insulator layer over the first plurality of conductive lines and the substrate, removing portions of the insulator layer to define cavities in the insulator layer that expose portions of the substrate and the first plurality of conductive lines, wherein the removal of the portions of the insulator layer results in a substantially random arrangement of cavities exposing portions of the substrate and the first plurality of conductive lines, depositing a conductive material in the cavities, and forming a second plurality of conductive lines on portions of the conductive material in the cavities and the insulator layer.
申请公布号 US2015348899(A1) 申请公布日期 2015.12.03
申请号 US201514825303 申请日期 2015.08.13
申请人 International Business Machines Corporation 发明人 Feng Kai D.;Li Wai-Kin;Wang Ping-Chuan;Yang Zhijian
分类号 H01L23/522;H01L23/528 主分类号 H01L23/522
代理机构 代理人
主权项 1. An interconnect array comprising: a first plurality of conductive lines arranged in a substrate; an insulator layer disposed on the first plurality of conductive lines; a second plurality of conductive lines arranged in the insulator layer, wherein portions of the second plurality of conductive lines overlap portions of the first plurality of conductive lines; and a plurality of vias defined by the insulator layer, the plurality of vias arranged in a random pattern.
地址 Armonk NY US