| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas barrier film having stable gas barrier performance or adhesiveness for a long period of time even in a high-temperature high-humidity environment.SOLUTION: The gas barrier film contains a resin substrate and a gas barrier layer, which is formed on at least one surface side of the resin substrate and contains a silicon atom, an oxygen atom and a carbon atom. The gas barrier layer is characterized in that a change rate of a Si-C bond is 15% or lower before and after it is preserved for 300 hours in a 85°C and 85% RH (relative humidity) environment and the composition thereof is changed continuously in the layer thickness direction. The gas barrier film satisfies the following requirements (1) and (2). The requirement (1) is that when an element distribution is measured in the depth direction of the gas barrier layer by an X-ray photoelectron spectroscopy, a carbon distribution curve, which shows a relationship between a distance from the surface of the gas barrier layer in the layer thickness direction and a ratio (a carbon atom ratio (at%)) of the amount of the carbon atom to the total amount (100 at%) of the silicon atom, the oxygen atom and the carbon atom, has at least one extreme value and an absolute value of a difference between the maximum value of the carbon atom ratio and the minimum value is 5 at% or higher. The requirement (2) is that the average atom ratio of each of the silicon atom, the oxygen atom and the carbon atom to the total amount (100 at%) has a magnitude relationship in the order shown by the expression (A) or (B) in a range of 90% or more of the total layer height of the gas barrier layer. |
