IMAGING ON SUBSTRATES WITH AQUEOUS ALKALINE SOLUBLE UV BLOCKING COMPOSITIONS AND AQUEOUS SOLUBLE UV TRANSPARENT FILMS

摘要

Substrates, such as printed circuit boards, are coated with an aqueous alkaline developable UV photosensitive material followed by applying an aqueous soluble UV transparent film to coat the UV photosensitive material. An aqueous alkaline soluble UV blocking composition is selectively applied to the surface of the UV blocking film to function as a mask. UV light is applied to portions of the UV photosensitive material not covered by the mask. The UV blocking composition, UV transparent film and selective sections of the UV photosensitive material are simultaneously removed with an aqueous alkaline developer solution to form an image on the substrate.

主权项

1. A method comprising:
a. providing a substrate comprising one or more apertures; b. applying an aqueous alkaline soluble UV photosensitive material adjacent a surface of the substrate comprising the one or more apertures; c. applying an aqueous soluble UV transparent film adjacent the aqueous alkaline soluble UV photosensitive material; d. selectively applying an aqueous alkaline soluble UV blocking composition adjacent the aqueous soluble UV transparent film; e. exposing the aqueous alkaline soluble UV photosensitive material to UV radiation except in regions covered with the aqueous alkaline soluble UV blocking composition; and f. simultaneously removing the aqueous alkaline soluble UV blocking composition, the aqueous soluble UV transparent film and selective portions of the aqueous alkaline soluble UV photosensitive material with an aqueous alkaline solution.