发明名称 PASS-THROUGH DEPOSITION SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a substrate deposition system capable of preventing the substrate from being damaged and the cathode from operating unstably when the wafer pallet acting as an anode moves into and out of the deposition chamber.SOLUTION: A substrate deposition system 10 includes: a wafer pallet 108 having a bottom and a top; and an anode. The top of the wafer pallet 108 is configured to hold a substrate wafer 106. The anode has a substantially fixed position relative to the wafer pallet 108 and is configured to move with the wafer pallet through the deposition chamber 100. The anode is electrically isolated from the substrate wafer 106. The substrate wafer 106 and the wafer pallet 108 are maintained at the same electrical potential.
申请公布号 JP2015214751(A) 申请公布日期 2015.12.03
申请号 JP20150118570 申请日期 2015.06.11
申请人 SUNPOWER CORP 发明人 PETER COUSINS;HSIN-CIAO LUAN;THOMAS PASS;JOHN FERRER;REX GALLARDO;STEPHEN F MAYER
分类号 C23C14/34 主分类号 C23C14/34
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