| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithography apparatus advantageous in terms of overlay accuracy.SOLUTION: In a lithography apparatus for patterning on a substrate with a charged particle beam, an optical system has a function for adjusting the focal position of a charged particle beam and the irradiation position of a charged particle beam on the substrate, and the substrate is irradiated with a charged particle beam. A control section controls an optical system so as to perform patterning while adjusting the focal position and irradiation position based on the surface shape of the substrate for adjusting the focal position. |
