| 摘要 |
Disclosed are self-assembled structures formed from self-assembling diblock copolymers of the formula (I):;;wherein R1-R4, n, and m are as described herein, which find use in preparing nanoporous membranes. In embodiments of the self-assembled structure, the block copolymer self-assembles into a cylindrical morphology. Also disclosed is a method of preparing such self-assembled structure which involves spin coating a polymer solution containing the diblock copolymer to obtain a thin film, followed by solvent annealing of the film. Further disclosed is a method of preparing porous membranes from the self-assembled structures. |
| 主权项 |
1. A method of preparing a self-assembled structure comprising a diblock copolymer of the formula (I):wherein:
R1 is a poly(alkyleneoxide) group of the formula, —(CHR—CH2—O)p—R′, wherein p=2-6, R is H or methyl, and R′ is H, a C1-C6 alkyl group, or a C3-C11 cycloalkyl group; R2 is a C6-C20 aryl group or a heteroaryl group, optionally substituted with a substituent selected from hydroxy, amino, halo, alkoxy, alkylcarbonyl, alkoxycarbonyl, amido, and nitro; one of R3 and R4 is a C6-C14 aryl group, optionally substituted with a substituent selected from hydroxy, halo, amino, and nitro, and the other of R3 and R4 is a C1-C22 alkoxy group, optionally substituted with a substituent selected from carboxy, amino, mercapto, alkynyl, alkenyl, halo, azido, and heterocyclyl; and n and m are independently about 10 to about 2000;the method comprising:
(i) dissolving the diblock copolymer in a solvent system to obtain a polymer solution; (ii) spin coating the polymer solution onto a substrate; (iii) annealing the coating obtained in (ii) to obtain a self-assembled structure; and optionally (iv) washing the self-assembled structure obtained in (iii). |
