PLASMA ENHANCED PHYSICAL VAPOR DEPOSITION SOURCE AND DEPOSITION APPARATUS USING SAME

摘要

A plasma enhanced physical vapor deposition source is set forth. The plasma enhanced physical vapor deposition source that is the present invention comprises: a crucible having a vaporization material receiving space therein and a plasma generating space above the vaporization material receiving space; a vaporization material inside the vaporization material receiving space; heating means configured to vaporize the vaporization material; plasma generating means disposed in the plasma generating space and configured to guide plasma from the vaporization material vaporized by the heating means; and an ejecting unit formed on the top surface of the crucible and configured to guide the vaporization material formed into plasma to the outside of the crucible.