发明名称 Oxide Thin Film Transistor and Manufacturing Method Thereof, Array Substrate and Display Device
摘要 The present invention provides an oxide thin film transistor and a manufacturing method thereof, an array substrate and a display device. The oxide thin film transistor of the present invention comprises a substrate, and a gate, a gate insulation layer, an oxide semiconductor active layer, a source and a drain, which are sequentially formed on the substrate, wherein, the oxide thin film transistor further comprises a transition layer formed between the oxide semiconductor active layer and the source and between the oxide semiconductor active layer and the drain, the transition layer comprises a metal layer and a protective layer, and the protective layer is in contact with the oxide semiconductor active layer, the metal layer is arranged on the protective layer and in contact with the source and the drain, and the protective layer is made of a metal oxide.
申请公布号 US2015349139(A1) 申请公布日期 2015.12.03
申请号 US201414422832 申请日期 2014.04.30
申请人 BOE TECHNOLOGY GROUP CO., LTD. 发明人 LIU Xiang
分类号 H01L29/786;H01L27/12;H01L21/3205;H01L21/321;H01L29/66;H01L29/45 主分类号 H01L29/786
代理机构 代理人
主权项
地址 Beijing CN