METHOD FOR PRODUCING A WAVEFRONT-CORRECTED OPTICAL ARRANGEMENT COMPRISING AT LEAST TWO OPTICAL ELEMENTS

摘要

The invention relates to a method for producing a wavefront-corrected optical arrangement comprising at least two optical elements. Using the method, a total wavefront error in the optical arrangement is determined and compared to a permissible tolerance range for the total wavefront error. To perform the method, the optical elements are individualized by assigning an individual identifier to each of them, such that individualized optical elements are obtained, individual surface defects are measured with correct coordinates on all the individualized optical elements and the measured individual surface defects are stored with correct coordinates assigned to the appropriate individualized optical element. The optical arrangement comprising the individualized optical elements is produced virtually as a virtual optical arrangement and a total wavefront error is calculated for the virtual optical arrangement.

主权项

1. A method for producing a wavefront-corrected optical arrangement comprising at least two optical elements, in which
in a step a) a total wavefront error for the optical arrangement is ascertained; in a step b) the total wavefront error is compared to a permissible tolerance range for the total wavefront error; in a step c) at least one of the optical elements is selected if the permissible tolerance range is exceeded; and in a step d) the optical properties of the at least one selected optical element are changed such that the ascertained total wavefront error for the optical arrangement will be within the permissible tolerance range, wherein
before step a)in a step a-2) the optical elements are individualized by assigning them in each case an individual identifier, such that individualized optical elements are present, individual surface errors are measured with the correct coordinates for all individualized optical elements, and the measured individual surface errors are stored with the correct coordinates in a manner in which they are assigned to the respective individualized optical element, andin a step a-1) the optical arrangement with the individualized optical elements is produced virtually as a virtual optical arrangement,
in step a), the total wavefront error of the virtual optical arrangement is ascertained, by way of calculation, from the individual surface errors and a calculated total wavefront error is obtained, wherein the total wavefront error is the totality of wavefront errors over all field points, such that correction of the total wavefront error is made possible for all field points simultaneously;in step b), the calculated total wavefront error is compared to the permissible tolerance range for the total wavefront error,in step d) the optical properties of the at least one selected individualized optical element are changed virtually such that the calculated total wavefront error for the optical arrangement will be within the permissible tolerance range,in a step e) the virtually effected changes to the optical properties of the at least one selected individualized optical element are stored as processing data and made available such that they can be retrieved repeatedly, andin a step f) the at least one selected individualized optical element is processed according to the processing data, and the optical arrangement is produced with the individualized optical elements.