发明名称 MANUFACTURING METHOD OF THICK FILM WIRING STRUCTURE AND THICK FILM WIRING STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a thick film wiring structure and a thick film wiring structure that electroless plating is unnecessary, the thick film wiring can be shaped in a short time, unevenness of the film thickness of the thick film wiring is little, and resistivity is low.SOLUTION: A manufacturing method of a thick film wiring structure 1 includes: a porous electrical conduction membrane formation step forming a porous electrical conduction membrane 30 having air gap inside on a surface of a substrate 10; and a compact electrical conduction membrane formation step forming a compact electrical conduction membrane 40 that the porous electrical conduction membrane 30 became compact by electrolytic plating the porous electrical conduction membrane 30.
申请公布号 JP2015214729(A) 申请公布日期 2015.12.03
申请号 JP20140098435 申请日期 2014.05.12
申请人 YAZAKI CORP;NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY 发明人 TAKIGUCHI ISAO;YO NAN;TOKUHISA HIDEO;TOKORO KAZUHIKO;YOSHIDA MANABU;TOMITA MITSURU;MORITA TOMOKO
分类号 C25D5/56;C23C4/02;C23C24/04;C23C24/08;C25D7/00;H05K3/10;H05K3/12;H05K3/14;H05K3/24 主分类号 C25D5/56
代理机构 代理人
主权项
地址