发明名称 |
MANUFACTURING METHOD OF THICK FILM WIRING STRUCTURE AND THICK FILM WIRING STRUCTURE |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a thick film wiring structure and a thick film wiring structure that electroless plating is unnecessary, the thick film wiring can be shaped in a short time, unevenness of the film thickness of the thick film wiring is little, and resistivity is low.SOLUTION: A manufacturing method of a thick film wiring structure 1 includes: a porous electrical conduction membrane formation step forming a porous electrical conduction membrane 30 having air gap inside on a surface of a substrate 10; and a compact electrical conduction membrane formation step forming a compact electrical conduction membrane 40 that the porous electrical conduction membrane 30 became compact by electrolytic plating the porous electrical conduction membrane 30. |
申请公布号 |
JP2015214729(A) |
申请公布日期 |
2015.12.03 |
申请号 |
JP20140098435 |
申请日期 |
2014.05.12 |
申请人 |
YAZAKI CORP;NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY |
发明人 |
TAKIGUCHI ISAO;YO NAN;TOKUHISA HIDEO;TOKORO KAZUHIKO;YOSHIDA MANABU;TOMITA MITSURU;MORITA TOMOKO |
分类号 |
C25D5/56;C23C4/02;C23C24/04;C23C24/08;C25D7/00;H05K3/10;H05K3/12;H05K3/14;H05K3/24 |
主分类号 |
C25D5/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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