发明名称 SEMICONDUCTOR DEVICE HAVING JUNCTIONLESS VERTICAL GATE TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
摘要 A junctionless vertical gate transistor includes an active pillar vertically protruding from a substrate and including a first impurity region, a second impurity region and a third impurity region sequentially formed over the first impurity region; gate electrodes coupled to sidewalls of the second impurity region; and bit lines arranged in a direction of intersecting with the gate electrodes and each contacting the first impurity region. The first to the third impurity regions include impurities of the same polarity.
申请公布号 US2015348976(A1) 申请公布日期 2015.12.03
申请号 US201514825030 申请日期 2015.08.12
申请人 SK hynix Inc. ;Korea Advanced Institute of Science and Technology 发明人 MOON Jung-Min;KIM Tae-Kyun;LEE Seok-Hee
分类号 H01L27/108;H01L29/78;H01L29/10;H01L29/66 主分类号 H01L27/108
代理机构 代理人
主权项 1. A method of manufacturing a semiconductor device, comprising: forming a plurality of bit lines buried within a substrate and extending along a first direction; forming active pillars over the bit lines, each of the active pillars including a first impurity region contacting the bit line and second and third impurity regions sequentially formed on the first impurity region; and forming gate electrodes over sidewalls of the second impurity regions in a direction of crossing with the bit lines.
地址 Icheon KR