发明名称 |
SEMICONDUCTOR DEVICE HAVING JUNCTIONLESS VERTICAL GATE TRANSISTOR AND METHOD OF MANUFACTURING THE SAME |
摘要 |
A junctionless vertical gate transistor includes an active pillar vertically protruding from a substrate and including a first impurity region, a second impurity region and a third impurity region sequentially formed over the first impurity region; gate electrodes coupled to sidewalls of the second impurity region; and bit lines arranged in a direction of intersecting with the gate electrodes and each contacting the first impurity region. The first to the third impurity regions include impurities of the same polarity. |
申请公布号 |
US2015348976(A1) |
申请公布日期 |
2015.12.03 |
申请号 |
US201514825030 |
申请日期 |
2015.08.12 |
申请人 |
SK hynix Inc. ;Korea Advanced Institute of Science and Technology |
发明人 |
MOON Jung-Min;KIM Tae-Kyun;LEE Seok-Hee |
分类号 |
H01L27/108;H01L29/78;H01L29/10;H01L29/66 |
主分类号 |
H01L27/108 |
代理机构 |
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代理人 |
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主权项 |
1. A method of manufacturing a semiconductor device, comprising:
forming a plurality of bit lines buried within a substrate and extending along a first direction; forming active pillars over the bit lines, each of the active pillars including a first impurity region contacting the bit line and second and third impurity regions sequentially formed on the first impurity region; and forming gate electrodes over sidewalls of the second impurity regions in a direction of crossing with the bit lines. |
地址 |
Icheon KR |