FILM DEPOSITION APPARATUS

摘要

A film deposition apparatus includes a vacuum chamber and a turntable provided in the vacuum chamber. A concave portion is formed in a surface of the turntable to accommodate a substrate therein, and a pedestal portion is provided to support a location inside a periphery of the substrate in the concave portion. At least one communication passage is formed in a wall portion of the concave portion to cause a first space around the pedestal portion in the concave portion to be in communication with a second space outside the turntable provided in an end area of the concave portion located opposite to a first center of the turntable when seen from a second center of the concave portion. An exhaust opening is provided to evacuate the vacuum chamber.

主权项

1. A film deposition apparatus, comprising:
a vacuum chamber; a turntable provided in the vacuum chamber; a concave portion formed in a surface of the turntable to accommodate a substrate therein; a pedestal portion to support a location inside a periphery of the substrate in the concave portion; at least one communication passage formed in a wall portion of the concave portion to cause a first space around the pedestal portion in the concave portion to be in communication with a second space outside the turntable provided in an end area of the concave portion located opposite to a first center of the turntable when seen from a second center of the concave portion; and an exhaust opening to evacuate the vacuum chamber.