SEMICONDUCTOR MANUFACTURING METHOD AND SEMICONDUCTOR MANUFACTURING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing method capable of preventing an element from getting damaged by an electromagnetic field during anneal processing of the element placed on a substrate by using plasma while generating the plasma in an electromagnetic field.SOLUTION: The semiconductor manufacturing method is for heat treating a substrate S with plasma while moving the substrate S formed with an element relative to a plasma generator 12 which generates plasma P by subjecting a plasma gas to an electromagnetic field. In a state that a second surface Sb at the side opposite to a first surface Sa of the substrate S formed with the element is faced to the plasma generator 12, the second surface Sb of the substrate S is irradiated with a plasma P of the plasma generator 12.