ELECTROSTATIC ATTRACTION APPARATUS, ELECTROSTATIC CHUCK AND COOLING TREATMENT APPARATUS

摘要

Provided is an electrostatic attraction apparatus in which a first insulating layer is formed on a base in an electrostatic chuck. A first portion of the first insulating layer extends on a first face of the base and a second portion of the first insulating layer extends on at least a portion of a second face of the base. An attraction electrode is formed on the first portion of the first insulating layer. A second insulating layer is formed on the first portion of the first insulating layer and the attraction electrode. A conductor pattern extends from the attraction electrode and provides a power supply terminal on the second portion of the first insulating layer. A contact part of a terminal member urged by an urging unit is in contact with the power supply terminal. The terminal member is connected with a wiring line connected to a supply power.

主权项

1. An electrostatic attraction apparatus comprising:
an electrostatic chuck configured to attract and hold a processing target object, the electrostatic chuck including:
a base including a first face and a second face different from the first face,a first insulating layer formed on the base and including a first portion extending on the first face and a second portion extending on at least a portion of the second face,an attraction electrode formed on the first portion,a second insulating layer formed on the first portion and the attraction electrode, anda conductor pattern formed on the first insulating layer and electrically connected to the attraction electrode, the conductor pattern including a power supplying terminal formed on the second portion; a terminal member including a contact part contacted to the power supplying terminal; an urging unit configured to urge the contact part of the terminal member to the power supplying terminal; a wiring line electrically connected to the terminal member; and a power supply electrically connected to the wiring line.