| 发明名称 |
Etching Apparatus and Method |
| 摘要 |
An etchant is supplied to a workpiece. Furthermore, the workpiece is irradiated with spatially modulated light to adjust a temperature profile of the workpiece while etchant is supplied. |
| 申请公布号 |
US2015348852(A1) |
申请公布日期 |
2015.12.03 |
| 申请号 |
US201514820344 |
申请日期 |
2015.08.06 |
| 申请人 |
Infineon Technologies AG |
发明人 |
Pilch Karl |
| 分类号 |
H01L21/66;H01L21/306 |
主分类号 |
H01L21/66 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method comprising:
supplying an etchant to a workpiece to be etched; and irradiating the workpiece with spatially modulated radiation to adjust a temperature profile of the workpiece while the etchant is being supplied to the workpiece. |
| 地址 |
Neubiberg DE |
