MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD

摘要

A measurement apparatus includes: an imaging unit positioned with fixing with respect to a first member; a first detector configured to detect a position of a stage with reference to a second member; a second detector configured to detect fluctuation of a position of the first member with reference to the second member; and a control unit configured to obtain the position of the mark from an image of the mark sensed by the imaging unit while controlling a relative position of the stage relative to the second member so as to reduce fluctuation of a relative position of the mark relative to the imaging unit due to the fluctuation of the position of the first member based on detection results of the first and second detectors.

主权项

1. A measurement apparatus for measuring a position of a mark on a stage, the apparatus comprising:
an imaging unit positioned with fixing with respect to a first member and configured to sense an image of the mark; a first detector configured to detect a position of said stage with reference to a second member; a second detector configured to detect fluctuation of a position of said first member with reference to said second member; and a control unit configured to obtain the position of the mark from an image of the mark sensed by said imaging unit while controlling a relative position of said stage relative to said second member so as to reduce fluctuation of a relative position of the mark relative to said imaging unit due to the fluctuation of the position of said first member based on a detection result of said first detector and a detection result of said second detector.