| 发明名称 |
AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, AND CHEMICAL MECHANICAL POLISHING METHOD |
| 摘要 |
A chemical mechanical polishing aqueous dispersion includes colloidal silica (A), an anionic water-soluble polymer (B), and at least one type of an alkanolamine salt (C) selected from the group consisting of an alkyl sulfate and an alkyl ether sulfate, the chemical mechanical polishing aqueous dispersion having a pH of 1 to 4. |
| 申请公布号 |
US2015344739(A1) |
申请公布日期 |
2015.12.03 |
| 申请号 |
US201314655575 |
申请日期 |
2013.12.11 |
| 申请人 |
JSR CORPORATION |
发明人 |
KAMEI Yasutaka;MIYAZAKI Yoshitaka;YAMANAKA Tatsuya;KONNO Tomohisa |
| 分类号 |
C09G1/02 |
主分类号 |
C09G1/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A chemical mechanical polishing aqueous dispersion, comprising:
colloidal silica (A), an anionic water-soluble polymer (B), and at least one an alkanolamine salt (C) selected from a group consisting of an alkyl sulfate and an alkyl ether sulfate, wherein the chemical mechanical polishing aqueous dispersion has a pH of 1 to 4. |
| 地址 |
Minato-ku JP |
