发明名称 Highly Reliable Nonvolatile Memory and Manufacturing Method Thereof
摘要 The present invention relates to a highly reliable nonvolatile memory and a manufacturing method thereof. The nonvolatile memory comprises top electrodes, bottom electrodes and a resistive material layer disposed therebetween, wherein the top electrodes are positioned on top in the memory; the bottom electrodes are positioned on a substrate; metal oxide for forming the resistive material layer is doped with metal; and a metal oxygen storage layer is further disposed between the top electrodes and the resistive material layer. The manufacturing method adopts a method in which a doping method and a double-layer forming method are combined, so that the highly reliable and highly uniform resistive random access memory can be fabricated and accordingly the performance of the memory can be increased.
申请公布号 US2015349253(A1) 申请公布日期 2015.12.03
申请号 US201314759624 申请日期 2013.09.30
申请人 PEKING UNIVERSITY 发明人 Huang Ru;Yu Muxi;Cai Yimao;Bai Wenliang;Huang Yinglong
分类号 H01L45/00 主分类号 H01L45/00
代理机构 代理人
主权项 1. A nonvolatile memory comprising: top electrodes, bottom electrodes and a resistive material layer disposed therebetween, wherein the top electrodes are positioned on top in the memory; the bottom electrodes are positioned on a substrate; metal oxide for forming the resistive material layer is doped with metal; and a metal oxygen storage layer is further disposed between the top electrodes and the resistive material layer.
地址 Beijing CN