MOLD FOR NANOIMPRINT AND METHOD FOR MANUFACTURING THE SAME, MOLDED PRODUCT HAVING FINE RUGGED STRUCTURE, AND ALUMINUM BASE MATERIAL USED AS MOLD FOR NANOIMPRINT

摘要

PROBLEM TO BE SOLVED: To provide: a method for manufacturing a mold for nanoimprint having less concave defects; a molded product having a fine rugged structure manufactured using the mold for nanoimprint on its surface; and an aluminum base material which can be suitably used as a mold for nanoimprint.SOLUTION: There is provided a method for manufacturing a mold for nanoimprint in which an oxide film 14 having a plurality of pores 16 on a surface 12 of an aluminum base material 10, which comprises: a step (I) of polishing the surface of an aluminum parent material using a polishing liquid and a polishing body to obtain an aluminum base material; and after the step (I), a step (II) of forming the oxide film 14 on the surface 12 of the aluminum base material 10 by anodic oxidation, where the polishing liquid is an acidic or alkaline aqueous solution containing at least one additive selected from a reducing agent and an oxidizing agent, a polishing agent and water.