| 摘要 |
A deposition apparatus (100) includes: a first moving apparatus (130) that changes, step by step, relative positions of a deposition mask (120) and a substrate (50) in the direction parallel to one surface (51) in a state wherein the deposition mask (120) and the substrate (50) are separated from each other; and a gap adjustment apparatus (140), which adjusts a gap between the deposition mask (120) and the substrate (50) by relatively moving, before the first moving apparatus (130) starts to relatively move the deposition mask (120) and the substrate (50), the deposition mask (120) and the substrate (50) in the direction to be separated from each other, and which adjusts the gap between the deposition mask (120) and the substrate (50) by relatively moving the deposition mask (120) and the substrate (50) in the direction to be close to each other, at the time when the first moving apparatus (130) stops the relative moving of the deposition mask (120) and the substrate (50). |
