APPARATUS FOR PROCESSING SUBSTRATE

摘要

The present invention relates to an apparatus for processing a substrate. The apparatus includes: a chamber having a process space formed inside; a hollow susceptor disposed to be extended in one direction inside the chamber; a heat source unit prepared on an inner wall of the chamber and enclosing at least outer side of the susceptor; and a substrate support unit prepared to be separated from the susceptor inside the susceptor and fixing a sheet-shaped substrate in the form of a roll, thereby easily processing a large area substrate.