REDUCED RESIDUAL FORMATION IN ETCHED MULTI-LAYER STACKS
摘要
<p>A multi-layer stack for imprint lithography is formed by applying a first polymerizable composition to a substrate, polymerizing the first polymerizable composition to form a first polymerized layer, applying a second polymerizable composition to the first polymerized layer, and polymerizing the second polymerizable composition to form a second polymerized layer on the first polymerized layer. The first polymerizable composition includes a polymerizable component with a glass transition temperature less than about 25° C., and the first polymerized layer is substantially impermeable to the second polymerizable composition.</p>
申请公布号
EP2188831(B1)
申请公布日期
2015.12.02
申请号
EP20080795566
申请日期
2008.08.25
申请人
CANON NANOTECHNOLOGIES, INC.;MOLECULAR IMPRINTS, INC.
发明人
XU, FRANK, Y.;LIU, WEIJUN;BROOKS, CYNTHIA, B.;LABRAKE, DWAYNE, L.;LENTZ, DAVID., J.