HARDMASK COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE HARDMASK COMPOSITION

摘要

A hardmask composition may include a solvent and a 2-dimensional carbon nanostructure containing about 0.01 atom% to about 40 atom% of oxygen or a 2-dimensional carbon nanostructure precursor thereof. A content of oxygen in the 2-dimensional carbon nanostructure precursor may be lower than about 0.01 atom% or greater than about 40 atom %. The hardmask composition may be used to form a fine pattern.