Ag ALLOY FILM-FORMING SPUTTERING TARGET, Ag ALLOY FILM, Ag ALLOY REFLECTIVE FILM, Ag ALLOY ELECTROCONDUCTIVE FILM, Ag ALLOY SEMI-PERMEABLE FILM

摘要

Provided are a sputtering target for forming a Ag alloy film, a Ag alloy film, a Ag alloy reflective film, a Ag alloy conductive film, and a Ag alloy semi-transparent film. The sputtering target includes, as a composition, 0.2 at% to 2.0 at% of Sb, 0.05 at% to 1.00 at% of Mg, and a balance consisting of Ag and inevitable impurities.