发明名称 熱処理が可能な低放射ガラス積層体及びその製造方法
摘要 <p>Disclosed are: a low-emissivity glass which is outstandingly durable and is heat treatable without any changes in its characteristics before and after the heat treatment; and a production method therefor. The heat-treatable low-emissivity glass according to the present invention is characterized in that it comprises: a sunlight-adjusting metal layer which is formed above a glass substrate; a first dielectric layer which is formed below the sunlight-adjusting metal layer; a second dielectric layer which is formed above the sunlight-adjusting metal layer; and an uppermost protective layer which is formed above the second dielectric layer, and in that the first dielectric layer has a structure obtained by the lamination of a lowermost dielectric layer comprising a metal oxide and a lower metal protective dielectric layer comprising a metal (oxy)nitride, and an advantage of the present invention is that there is no change in the characteristics of the low-emissivity glass even after heat treatment.</p>
申请公布号 JP5827405(B2) 申请公布日期 2015.12.02
申请号 JP20140525924 申请日期 2012.08.06
申请人 エルジー・ハウシス・リミテッドLG HAUSYS,LTD. 发明人 キム・ウンキル;クウォン・デフン;ジュン・ヨンキ
分类号 C03C17/36;B32B17/06;B32B37/00 主分类号 C03C17/36
代理机构 代理人
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